Abstract

The anodization of aluminum foils having micrometer thickness is a common process and results in hexagonally self-ordered alumina membranes. However, anodic aluminum oxide (AAO) membranes fabricated from nanometer-thin films present new challenges to the anodization process, since aluminum films adheres poorly on supporting substrates and the smoothness of the film is highly related to the kind of substrate. In the current work we studied the effect of the aluminum thickness and roughness, using films ranging from 100 to 800 nm in thickness and from 2 to 15 nm in root means square roughness (on a scan area of 100 μm2), on the final alumina morphology. We deposited Al thin films by sputtering method on transparent conductive glass substrates. A strong dependence between the Al film roughness and the final alumina pore organization was observed. It was also determined that by reducing the Al film thickness, smaller Al grains were generated, leading to a homogenous pore formation. It was found that, for thicknesses below 300 nm, the electrolyte used to perform anodization becomes a critical parameter due to the competitive effect of aluminum delamination with respect to the anodization reaction. Phosphoric acid showed less delamination problems than oxalic acid.