Article ISI SCOPUS
PLASMA SOURCES SCIENCE TECHNOLOGY  (2018)

Study of dual radio frequency capacitively coupled plasma: an analytical treatment matched to an experiment

Saikia, P; Bhuyan, H; Escalona, M; Favre, M; Wyndham, E; Maze, J; Schulze, J

Keywords: capacitively coupled rf plasma, dual frequency, sheath potential, plasma parameters, DC self-bias

Más información

Título según WOS: Study of dual radio frequency capacitively coupled plasma: an analytical treatment matched to an experiment
Título según SCOPUS: Study of dual radio frequency capacitively coupled plasma: An analytical treatment matched to an experiment
Título de la Revista: PLASMA SOURCES SCIENCE TECHNOLOGY
Volumen: 27
Número: 1
Editorial: IOP PUBLISHING LTD
Fecha de publicación: 2018
Idioma: English
DOI:

10.1088/1361-6595/aaa565
Notas: ISI, SCOPUS