Oxidation at the Si/SiO2 interface: Influence of the spin degree of freedom
Abstract
We show, using first-principles spin-polarized total-energy calculations, that depending on the spin configuration of the system, the reaction of an O-2 molecule with a Si-Si bond in a suboxidized region might result either in a peroxy linkage defect (for a singlet spin state) or in a perfect Si-O-Si bond plus an interstitial O atom (for a triplet spin state). Even though the singlet has a lower energy than the triplet configuration, we find a rather small probability for triplet to singlet conversion. Therefore, as the O-2 in an SiO2 interstitial site has a triplet configuration, this reaction spin dependence may have a strong influence on the high quality of the Si/SiO2 interface.
Más información
| Título según WOS: | ID WOS:000180318300036 Not found in local WOS DB |
| Título de la Revista: | PHYSICAL REVIEW LETTERS |
| Volumen: | 90 |
| Número: | 1 |
| Editorial: | AMER PHYSICAL SOC |
| Fecha de publicación: | 2003 |
| DOI: |
10.1103/PhysRevLett.90.016103 |
| Notas: | ISI |