Fluorine-free and fluorine containing MOCVD precursors for electronic oxides: a comparison
Abstract
MOCVD processes adopting two different precursors Sr(tmhd)(2)pmdeta and Sr(hfac)(2)tetraglyme have been compared. In situ FT-IR monitoring shows that Sr(hfac)(2)tetraglyme posses suitable thermal stability upon sublimation and good mass-transport properties. By contrast, Sr(tmhd)(2)pmdeta posses lower stability which precludes efficient sublimation/evaporation processes, thus requiring reactors equipped with liquid delivery systems for efficient MOCVD processes. Insights on the MOCVD process have been obtained combining in situ FT-IR and ex situ XRD, XPS, SEM and EDX techniques. Homogeneous films have been deposited on Pt/TiN/SiO2/Si substrates in the 300-500 degrees C temperature range. XRD and XPS analyses have shown that fluorine or carbonate containing films are obtained adopting Sr(hfac)(2)tetraglyme or Sr(dpM)(2)pmdeta, respectively. (c) 2004 Published by Elsevier B.V.
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| Título según WOS: | ID WOS:000228514800057 Not found in local WOS DB |
| Título de la Revista: | MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS |
| Volumen: | 118 |
| Número: | 1-3 |
| Editorial: | Elsevier |
| Fecha de publicación: | 2005 |
| Página de inicio: | 264 |
| Página final: | 269 |
| DOI: |
10.1016/j.mseb.2004.12.045 |
| Notas: | ISI |