MOCVD of Sr-containing oxides: Transport properties and deposition mechanisms of the Sr(tmhd)(2)center dot pmdeta precursor
Abstract
Metal-organic (MO)CVD processes adopting the Sr(tmhd)(2)(.)pmdeta precursor have been investigated. In-situ Fourier-transform infrared spectroscopy (FTIR) monitoring has shown that Sr(tmhd)2.pmdeta possesses a low stability which precludes efficient sublimation/evaporation processes, and requires reactors equipped with a direct liquid injector (DLI) for suitable MOCVD processes. The deposition process results in the formation of polycrystalline SrO and/or SrCO3 films. The kinetics and the mechanism of film growth have been investigated combining in-situ FTIR techniques and ex-situ techniques for chemical and structural analyses - energy dispersive X-ray (EDX) microanalysis, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD). Precursor decomposition occurs above 300 degrees C, leading to the formation of ketones and SrO films. Temperatures above 400 degrees C and partial pressures above 9 mtorr favor a further oxidation/combustion of the ligand and its by-products, thus producing greater amounts of CO2, and hence of SrCO3.
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| Título según WOS: | ID WOS:000229767100007 Not found in local WOS DB |
| Título de la Revista: | CHEMICAL VAPOR DEPOSITION |
| Volumen: | 11 |
| Número: | 5 |
| Editorial: | WILEY-V C H VERLAG GMBH |
| Fecha de publicación: | 2005 |
| Página de inicio: | 269 |
| Página final: | 275 |
| DOI: |
10.1002/cvde.200406356 |
| Notas: | ISI |