Microstructural characterization of dispersion-strengthened Cu-Ti-Al alloys obtained by reaction milling

Espinoza, RA; Palma, RH; Sepulveda, AO; Fuenzalida V.; Solorzano, G; Craievich, A; Smith, DJ; Fujita T.; Lopez M.

Abstract

The microstructure, electrical conductivity and hot softening resistance of two alloys (G-10 and H-20), projected to attain Cu-2.5 vol.% TiC-2.5 vol.% Al2O3 nominal composition, and prepared by reaction milling and hot extrusion, were studied. The alloys were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and several chemical analysis techniques. The first alloy, G-10, showed the formation of Al2O3 nanodispersoids and the presence of particles from non-reacted raw materials (graphite, Ti and Al). A second alloy, H-20, was prepared employing different fabrication conditions. This alloy exhibited a homogeneous distribution of Al2O3 and Ti-Al-Fe nanoparticles, with the microstructure being stable after annealing and hot compression tests. These nanoparticles acted as effective pinning sites for dislocation slip and grain growth. The room-temperature hardness of the H-20 consolidated material (330 HV) was approximately maintained after annealing for 1 h at 1173 K; the electrical conductivity was 60% IACS (International Annealing Copper Standard). © 2006 Elsevier B.V. All rights reserved.

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Título según WOS: Microstructural characterization of dispersion-strengthened Cu-Ti-Al alloys obtained by reaction milling
Título según SCOPUS: Microstructural characterization of dispersion-strengthened Cu-Ti-Al alloys obtained by reaction milling
Título de la Revista: MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
Volumen: 454
Editorial: ELSEVIER SCIENCE SA
Fecha de publicación: 2007
Página de inicio: 183
Página final: 193
Idioma: English
URL: http://linkinghub.elsevier.com/retrieve/pii/S0921509306024555
DOI:

10.1016/j.msea.2006.11.042

Notas: ISI, SCOPUS