An electrochemical deposition route for obtaining alpha-Fe2O3 thin films - II. EQCM study and semiconductor properties
Abstract
The electrochemical formation of hematite (α- Fe2 O3) precursor thin films (oxyhydroxide iron compounds), onto gold substrates in an aqueous solution of Fe(III)+KF+ H2 O2 was investigated in situ using an electrochemical quartz crystal microbalance (EQCM) and voltammetric techniques. Nanostructured α- Fe2 O3 obtained after annealing of oxyhydroxide iron compounds thin films have been prepared onto SnO2 F covered glass substrates through a potential cycling procedure in this electrolytic bath. Photoelectrochemical measurements, carried out in 0.1 M NaOH+0.05 M KI electrolyte at pH 13, show an n-type behavior, a flatband potential of -1.08 V vs saturated mercury/mercury sulfate reference electrode, and an apparent donor density of 1.26× 1019 cm-3 at 1 kHz. © 2007 The Electrochemical Society.
Más información
Título según WOS: | An electrochemical deposition route for obtaining alpha-Fe2O3 thin films - II. EQCM study and semiconductor properties |
Título según SCOPUS: | An electrochemical deposition route for obtaining a- Fe 2O3 thin films: II. EQCM study and semiconductor properties |
Título de la Revista: | ELECTROCHEMICAL AND SOLID STATE LETTERS |
Volumen: | 10 |
Número: | 10 |
Editorial: | TAYLOR & FRANCIS LTD |
Fecha de publicación: | 2007 |
Página de inicio: | D95 |
Página final: | D99 |
Idioma: | English |
URL: | http://esl.ecsdl.org/cgi/doi/10.1149/1.2756160 |
DOI: |
10.1149/1.2756160 |
Notas: | ISI, SCOPUS |