Growth and morphology of ultra-thin Ni films on Pd(100)
Abstract
A series of Ni films with thickness from 0.2 monolayers (ML) to 12.5 ML were epitaxially grown on a Pd(1 0 0) substrate at room temperature. Growth and morphology were investigated by scanning tunneling microscopy (STM), reflection-high-energy-electron diffraction (RHEED) and Auger electron spectroscopy (AES). We found that the strain relief mechanism for the tetragonal distorted films is related with the appearance of 1 Å high-filaments. © 2008 Elsevier Ltd. All rights reserved.
Más información
| Título según WOS: | Growth and morphology of ultra-thin Ni films on Pd(100) |
| Título según SCOPUS: | Growth and morphology of ultra-thin Ni films on Pd(1 0 0) |
| Título de la Revista: | MICROELECTRONICS JOURNAL |
| Volumen: | 39 |
| Número: | 11 |
| Editorial: | ELSEVIER SCI LTD |
| Fecha de publicación: | 2008 |
| Página de inicio: | 1229 |
| Página final: | 1230 |
| Idioma: | English |
| URL: | http://linkinghub.elsevier.com/retrieve/pii/S0026269208000359 |
| DOI: |
10.1016/j.mejo.2008.01.050 |
| Notas: | ISI, SCOPUS |