Thick tellurium electrodeposition on nickel-coated copper substrate for I-124 production
Abstract
Tellurium electrodeposition on a nickel-coated copper substrate was investigated for production of iodine-124. The electrodeposition experiments were carried out by the alkali plating baths. The optimum conditions of the electrodeposition of tellurium were as follows: 6 g l-1 tellurium, pH=10, DC current density of ca. 8.55 mA cm-2 and room temperature. © 2008 Elsevier Ltd. All rights reserved.
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Título según WOS: | Thick tellurium electrodeposition on nickel-coated copper substrate for I-124 production |
Título según SCOPUS: | Thick tellurium electrodeposition on nickel-coated copper substrate for 124I production |
Título de la Revista: | APPLIED RADIATION AND ISOTOPES |
Volumen: | 66 |
Número: | 10 |
Editorial: | PERGAMON-ELSEVIER SCIENCE LTD |
Fecha de publicación: | 2008 |
Página de inicio: | 1281 |
Página final: | 1286 |
Idioma: | English |
URL: | http://linkinghub.elsevier.com/retrieve/pii/S0969804308001358 |
DOI: |
10.1016/j.apradiso.2008.02.082 |
Notas: | ISI, SCOPUS |