A method for thickness determination of thin films of amalgamable metals by total-reflection X-ray fluorescence
Abstract
A method for thickness determination of thin amalgamable metallic films by total-reflection X-ray fluorescence (TXRF) is presented. The peak's intensity in TXRF spectra are directly related to the surface density of the sample, i.e. to its thickness in a homogeneous film. Performing a traditional TXRF analysis on a thin film of an amalgamated metal, and determining the relative peak intensity of a specific metal line, the layer thickness can be precisely obtained. In the case of gold thickness determination, mercury and gold peaks overlap, hence we have developed a general data processing scheme to achieve the most precise results. © 2009 Elsevier B.V. All rights reserved.
Más información
| Título según WOS: | A method for thickness determination of thin films of amalgamable metals by total-reflection X-ray fluorescence |
| Título según SCOPUS: | A method for thickness determination of thin films of amalgamable metals by total-reflection X-ray fluorescence |
| Título de la Revista: | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS |
| Volumen: | 267 |
| Número: | 15 |
| Editorial: | Elsevier |
| Fecha de publicación: | 2009 |
| Página de inicio: | 2532 |
| Página final: | 2537 |
| Idioma: | English |
| URL: | http://linkinghub.elsevier.com/retrieve/pii/S0168583X09005473 |
| DOI: |
10.1016/j.nimb.2009.04.018 |
| Notas: | ISI, SCOPUS |