A method for thickness determination of thin films of amalgamable metals by total-reflection X-ray fluorescence

Bennun, L; Greaves, ED; Barros H.; Diaz-Valdes J.

Abstract

A method for thickness determination of thin amalgamable metallic films by total-reflection X-ray fluorescence (TXRF) is presented. The peak's intensity in TXRF spectra are directly related to the surface density of the sample, i.e. to its thickness in a homogeneous film. Performing a traditional TXRF analysis on a thin film of an amalgamated metal, and determining the relative peak intensity of a specific metal line, the layer thickness can be precisely obtained. In the case of gold thickness determination, mercury and gold peaks overlap, hence we have developed a general data processing scheme to achieve the most precise results. © 2009 Elsevier B.V. All rights reserved.

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Título según WOS: A method for thickness determination of thin films of amalgamable metals by total-reflection X-ray fluorescence
Título según SCOPUS: A method for thickness determination of thin films of amalgamable metals by total-reflection X-ray fluorescence
Título de la Revista: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Volumen: 267
Número: 15
Editorial: ELSEVIER SCIENCE BV
Fecha de publicación: 2009
Página de inicio: 2532
Página final: 2537
Idioma: English
URL: http://linkinghub.elsevier.com/retrieve/pii/S0168583X09005473
DOI:

10.1016/j.nimb.2009.04.018

Notas: ISI, SCOPUS