Complex permittivity and predominance of non-overlapping small-polaron tunneling conduction process in copper indium selenide compound

Essaleh M.; Bouferra R.; Mansori, M; Marin G.; Wasim S.M.; Singh D.P.

Keywords: semiconductors, complex permittivity, NSPT

Abstract

This paper presents a study of the complex permittivity of n-Type copper indium selenide semiconductor compound at low temperatures down to-175 C. Alternating current with frequency varying between 20 Hz and 1 MHz is applied to the material in order to measure the dielectric constant and dielectric loss D is found to decrease with temperature and frequency, whereas D decreases with frequency and increases with temperature. The experimental data of agree with the expression = Am(,T), where the frequency exponent m(T), calculated through the relation m(T) = (ln / ln )T , shows a frequency and temperature dependence. The data are analyzed in light of existing theoretical models.

Más información

Título según WOS: Complex permittivity and predominance of non-overlapping small-polaron tunneling conduction process in copper indium selenide compound
Título según SCOPUS: Complex permittivity and predominance of non-overlapping small-polaron tunneling conduction process in copper indium selenide compound
Título de la Revista: International Journal of Materials Research
Volumen: 114
Número: 2
Editorial: WALTER DE GRUYTER GMBH
Fecha de publicación: 2023
Página de inicio: 111
Página final: 117
Idioma: English
DOI:

10.1515/ijmr-2022-0091

Notas: ISI, SCOPUS