Article ISI
Plasma Sources Science and Technology  (2018)

Study of dual radio frequency capacitively coupled plasma=> an analytical treatment matched to an experiment

Saikia, P; Bhuyan, H; Escalona, M; Favre, M; Wyndham, E; Maze, J; Schulze, J

Más información

Título de la Revista: Plasma Sources Science and Technology
Volumen: 27
Asunto: 1
Editorial: Institute of Physics
Fecha de publicación: 2018
DOI/URL:

10.1088/1361-6595/aaa565