Article
PLASMA SOURCES SCIENCE & TECHNOLOGY  (2018)

Study of dual radio frequency capacitively coupled plasma=> an analytical treatment matched to an experiment

Saikia, P; Bhuyan, H; Escalona, M; Favre, M; Wyndham, E; Maze, J; Schulze, J

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Título de la Revista: PLASMA SOURCES SCIENCE & TECHNOLOGY
Volumen: 27
Asunto: 1
Editorial: IOP PUBLISHING LTD
Fecha de publicación: 2018
DOI/URL:

10.1088/1361-6595/aaa565