Effects of technostress on continuance commitment and organizational performance in Chilean higher education institutions

Araya-Guzman, Sergio; Bueno-Broterson, Yarisel; Guinez-Perez, Marcela; Salazar-concha, Cristian

Abstract

in the digital age, the use of multiple technologies and the need to continuously adapt to different tools and platforms generate new pressures and demands for workers. In this context, the present study examines the effect of technostress and job satisfaction influence in continuance commitment and organizational performance in Chilean universities. To this end, a questionnaire previously adapted and validated from previous studies was administered to civil servants and administrative staff at universities in southern Chile who use digital technologies in their work. A total of 240 valid responses were obtained and analyzed using structural equations (PLS-SEM). The results show that technostress has a positive and significant effect on commitment to continuity, an atypical finding that contradicts the prevailing literature, which traditionally associates technostress with negative consequences on work attitudes. In addition, it was confirmed that job satisfaction is a determining factor in linking commitment and organizational performance. These findings contribute to the literature on technostress in university settings by demonstrating that, under certain institutional conditions, technostress can coexist with attitudes of adaptation and job retention. In addition, the results offer relevant information for promoting digitization strategies aimed at strengthening job satisfaction and people management in digitized environments.

Más información

Título según WOS: ID WOS:001734821300009 Not found in local WOS DB
Título de la Revista: RETOS-REVISTA DE CIENCIAS DE LA ADMINISTRACION Y ECONOMIA
Volumen: 16
Número: 31
Editorial: UNIV POLITECNICA SALESIANA ECUADOR-SALESIAN POLYTECNIC UNIV
Fecha de publicación: 2026
Página de inicio: 161
Página final: 178
DOI:

10.17163/ret.n31.2026.09

Notas: ISI