Abstract

Properties of thin granular Co-Si O2 films have been studied by means of ferromagnetic resonance (FMR). The obtained FMR results are discussed using sample magnetization, electrical conductivity, and transmission electron microscopy analysis. Co and Si O2 were sequentially deposited for the sample preparation. The general behavior of the applied field for resonance could be described using effective out-of-plane anisotropies. A dipolar interaction model developed for magnetic heterostructures was applied to the interpretation of these anisotropies. The anisotropy terms caused by the magnetic particle shapes and by the film shape can explain the results for two metallic films close to percolation, in which the film shape is the preponderant contribution. In the case of an insulating sample, the consideration of an additional anisotropy term seems to be necessary to explain the results. © 2006 American Institute of Physics.