Gelation of N 3P 3[NH(CH 2) 3Si(OEt) 3] 6-n[X] n X = NH(CH 2) 3Si(OEt) 3, NCH 3(CH 2) 3CN and OC 6H 4(CH 2)CN, n = 0 or 3 at the liquid/air/ interface

Díaz, C.; Yutronic, N; Valenzuela, M. L.; Aguirre P.

Abstract

The compounds N 3P 3[NH(CH 2) 3Si(OEt) 3] 6 (1), N 3P 3[NH(CH 2) 3Si(OEt) 3] 3[NCH 3(CH 2) 3CN] 3 (2) and N 3P 3[NH(CH 2) 3Si(OEt) 3] 3 [HOC 6H 4(CH 2)CN] 3 (3) undergo slow gelation at the interface oil/air at low temperatures to give perfect gels G 1, G 2 and G 3 respectively. TEM analysis reveals nanoparticles of silica with mean size of about 10 nm. Pyrolysis under air at 800 °C of these gels affords a mixture of mainly Si 5(PO 4) 6O, SiP 2O 7 and SiO 2. Gelation and pyrolysis products were characterized by IR, solid-state NMR, TEM, SEM-EDAX microscopy and X-ray diffraction. The sol-gel process in the interface liquid /air is discussed in comparison with the usual sol-gel solution process.

Más información

Título de la Revista: Journal of the Chilean Chemical Society
Volumen: 55
Número: 3
Editorial: SOC CHILENA QUIMICA
Fecha de publicación: 2010
Página de inicio: 415
Página final: 418
URL: http://www.scopus.com/inward/record.url?eid=2-s2.0-79951640791&partnerID=q2rCbXpz