Gelation of N 3P 3[NH(CH 2) 3Si(OEt) 3] 6-n[X] n X = NH(CH 2) 3Si(OEt) 3, NCH 3(CH 2) 3CN and OC 6H 4(CH 2)CN, n = 0 or 3 at the liquid/air/ interface
Abstract
The compounds N 3P 3[NH(CH 2) 3Si(OEt) 3] 6 (1), N 3P 3[NH(CH 2) 3Si(OEt) 3] 3[NCH 3(CH 2) 3CN] 3 (2) and N 3P 3[NH(CH 2) 3Si(OEt) 3] 3 [HOC 6H 4(CH 2)CN] 3 (3) undergo slow gelation at the interface oil/air at low temperatures to give perfect gels G 1, G 2 and G 3 respectively. TEM analysis reveals nanoparticles of silica with mean size of about 10 nm. Pyrolysis under air at 800 °C of these gels affords a mixture of mainly Si 5(PO 4) 6O, SiP 2O 7 and SiO 2. Gelation and pyrolysis products were characterized by IR, solid-state NMR, TEM, SEM-EDAX microscopy and X-ray diffraction. The sol-gel process in the interface liquid /air is discussed in comparison with the usual sol-gel solution process.
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| Título de la Revista: | JOURNAL OF THE CHILEAN CHEMICAL SOCIETY | 
| Volumen: | 55 | 
| Número: | 3 | 
| Editorial: | SOC CHILENA QUIMICA | 
| Fecha de publicación: | 2010 | 
| Página de inicio: | 415 | 
| Página final: | 418 | 
| URL: | http://www.scopus.com/inward/record.url?eid=2-s2.0-79951640791&partnerID=q2rCbXpz |