Abstract

In this paper non-stoichiometric tungsten oxide thin films have been successfully prepared by direct UV irradiation of bis-?-diketonate dioxotungsten(VI) precursor complexes spin-coated Si(1 0 0) substrates. Photodeposited films were characterized by Fourier transform-infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) and the surface morphology examined by Atomic Force Microscopy (AFM). The results of XRD analysis showed that the as-photodeposited WO 3-x films are amorphous and have a rougher surface than thermally treated films. Post-annealing of the films in air at 500 °C transforms the sub-oxides to a monoclinic WO 3 phase. © 2010 Elsevier Ltd. All rights reserved.