Chelating water-soluble polymers associated with ultrafiltration membranes for metal ion removal

Rivas B.L; Hube, S.; Sanchez J.; Pereira, E

Abstract

This article describes the retention properties of commercial chelating water-soluble polymers, for different metal ions in aqueous solution using a liquidphase polymer-based retention (LPR) technique. The polymers studied were poly(ethyleneimine) or P(EI) (water-free and a 50 % aqueous solution) and poly(ethyleneimine epichlorohydrin) or P(EIE) (a 17 % aqueous solution). These commercial polymers were fractionated by ultrafiltration membranes and then characterized by Fourier-transformed infrared spectroscopy. The extraction process was performed using the following metal ions: Cu 2+, Cd 2+, Co 2+, Ni 2+, Zn 2+, Pb 2+ and Cr 3+. In the washing studies, we varied the pH (3, 5 and 7) and retention time. The results showed that P(EI) showed high retention for all themetal ions at pH 7 and for selective retention of Cu 2+ at pH 5, while P(EIE) showed selective retention of Cu 2+ ions at pH 7. Using the enrichment method, the maximum retention capacity of Cu 2+ and Cd 2+ was achieved using a 50 % aqueous solution of P(EI) at pH 5 and 7, respectively. Finally, charge-discharge experiments for Cu 2+ were analysed by changing the pH from basic to acidic over three cycles. These results showed that it is possible to remove metal ions and regenerate the removal capacity of the polychelatogens using the LPR technique. © Springer-Verlag 2012.

Más información

Título según WOS: Chelating water-soluble polymers associated with ultrafiltration membranes for metal ion removal
Título según SCOPUS: Chelating water-soluble polymers associated with ultrafiltration membranes for metal ion removal
Título de la Revista: POLYMER BULLETIN
Volumen: 69
Número: 8
Editorial: Springer
Fecha de publicación: 2012
Página de inicio: 881
Página final: 898
Idioma: English
URL: http://www.scopus.com/inward/record.url?eid=2-s2.0-84868657274&partnerID=40&md5=e7385a289fa0d641ec10fad5a22f575e
DOI:

10.1007/s00289-012-0785-z

Notas: ISI, SCOPUS