Investigation of the ion beam emission from a pulsed power plasma device

Henríquez Á.; et al.

Abstract

Plasma Focus (PF) devices are well known as ion beam sources with characteristic energy among the hundreds of keV to tens of MeV. The information on ion beam energy, ion distribution and composition is essential from the viewpoint of understanding fundamental physics behind their production and acceleration and also their applications in various fields, such as surface properties modification, ion implantation, thin film deposition, semiconductor doping and ion assisted coating. An investigation from a low energy, 1.8 kJ 160 kA, Mather type plasma focus device operating with nitrogen using CR-39 detectors was conducted to study the emission of ions at different angular positions. Tracks on CR-39 detectors at different angular positions reveal the existence of angular ion anisotropy. The results obtained are comparable with the time integrated measurements using FC. Preliminary results of this work are presented.

Más información

Título según WOS: Investigation of the ion beam emission from a pulsed power plasma device
Título según SCOPUS: Investigation of the ion beam emission from a pulsed power plasma device
Título de la Revista: VIII INTERNATIONAL CONGRESS OF ENGINEERING PHYSICS
Volumen: 511
Número: 1
Editorial: IOP PUBLISHING LTD
Fecha de publicación: 2014
Idioma: English
DOI:

10.1088/1742-6596/511/1/012073

Notas: ISI, SCOPUS