Social class, psychosocial occupational risk factors, and the association with self-rated health and mental health in Chile

Rocha, KB; Muntaner, C; Solar, O; Borrell, C; Bernales, P; Gonzalez, MJ; Ibáñez C; Benach, J; Vallebuona C.

Keywords: mental health, social class, work

Abstract

The objective of this study was to analyze the association between social class and psychosocial occupational risk factors and self-rated health and mental health in a Chilean population. A cross-sectional study analyzed data from the First National Survey on Employment, Work, Quality of Life, and Male and Female Workers in Chile (N = 9,503). The dependent variables were self-rated health status and mental health. The independent variables were social class (neo-Marxist), psychosocial occupational risk factors, and material deprivation. Descriptive and logistic regression analyses were performed. There were inequalities in the distribution of psychosocial occupational risk factors by social class and sex. Furthermore, social class and psychosocial occupational risk factors were associated with unequal distribution of self-rated health and mental health among the working population in Chile. Occupational health interventions should consider workers' exposure to socioeconomic and psychosocial risk factors.

Más información

Título según WOS: Social class, psychosocial occupational risk factors, and the association with self-rated health and mental health in Chile
Título según SCOPUS: Social class, psychosocial occupational risk factors, and the association with self-rated health and mental health in Chile [Classe social, fatores psicossociais de risco ocupacional e sua associação com saúde autopercebida e mental no Chile] [Clase social, factores de riesgo psicosocial en el trabajo y su asociación con la salud autopercibida y mental en Chile]
Título de la Revista: CADERNOS DE SAUDE PUBLICA
Volumen: 30
Número: 10
Editorial: CADERNOS SAUDE PUBLICA
Fecha de publicación: 2014
Página de inicio: 2219
Página final: 2234
Idioma: Spanish
DOI:

10.1590/0102-311X00176213

Notas: ISI, SCOPUS