A comprehensive diagram to grow (0001)InGaN alloys by molecular beam epitaxy.
Abstract
The composition, strain and surface morphology of (0001)InGaN layers are investigated as a function of growth temperature (460–645 °C) and impinging In flux. Three different growth regimes: nitrogen-rich, metal-rich and intermediate metal-rich, are clearly identified and found to be in correlation with surface morphology and strain relaxation. Best epilayers’ quality is obtained when growing under intermediate metal-rich conditions, with 1–2 monolayers thick In ad-coverage. For a given In flux, the In incorporation decreases with increasing growth temperature due to InN thermal decomposition that follows an Arrhenius behavior with 1.84±0.12 eV activation energy.
Más información
| Título de la Revista: | Journal of Crystal Growth |
| Volumen: | 364 |
| Editorial: | ELSEVIER SCIENCE BV |
| Fecha de publicación: | 2013 |
| Página de inicio: | 123 |
| Página final: | 127 |
| Idioma: | English |