A comprehensive diagram to grow (0001)InGaN alloys by molecular beam epitaxy.

Ga?evi?, Ž.; Gómez, V. J.; Lepetit, N.G.; Soto Rodriguez, P. E. D.; Bengoechea, A.; Fernández-Garrido, S.; Nötzel, R.; Calleja, E

Abstract

The composition, strain and surface morphology of (0001)InGaN layers are investigated as a function of growth temperature (460–645 °C) and impinging In flux. Three different growth regimes: nitrogen-rich, metal-rich and intermediate metal-rich, are clearly identified and found to be in correlation with surface morphology and strain relaxation. Best epilayers’ quality is obtained when growing under intermediate metal-rich conditions, with 1–2 monolayers thick In ad-coverage. For a given In flux, the In incorporation decreases with increasing growth temperature due to InN thermal decomposition that follows an Arrhenius behavior with 1.84±0.12 eV activation energy.

Más información

Título de la Revista: Journal of Crystal Growth
Volumen: 364
Editorial: ELSEVIER SCIENCE BV
Fecha de publicación: 2013
Página de inicio: 123
Página final: 127
Idioma: English