High-resolution ellipsometric study of an n-alkane film, dotriacontane, adsorbed on a SiO2 surface

Volkmann, UG; Pino M.; Altamirano, LA; Taub H.; Hansen, FY

Abstract

Ellipsometric measurements of the optical thickness of C32 films adsorbed on SiO2-coated Si(100) substrates were carried out. A resolution and long-term stability comparable to that previously obtained with rare gases adsorbed on HOPG substrates in ultrahigh vacuum was demonstrated. The measurements revealed a rich structure in the temperature dependence of the polarization angle and stray light intensity previously unobserved with alkane films.

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Título según WOS: High-resolution ellipsometric study of an n-alkane film, dotriacontane, adsorbed on a SiO2 surface
Título según SCOPUS: High-resolution ellipsometric study of an n-alkane film, dotriacontane, adsorbed on a SiO2 surface
Título de la Revista: JOURNAL OF CHEMICAL PHYSICS
Volumen: 116
Número: 5
Editorial: AMER INST PHYSICS
Fecha de publicación: 2002
Página de inicio: 2107
Página final: 2115
Idioma: English
URL: http://scitation.aip.org/content/aip/journal/jcp/116/5/10.1063/1.1429645
DOI:

10.1063/1.1429645

Notas: ISI, SCOPUS