Stability and electronic structure of hydrogen-nitrogen complexes in GaAs

Orellana, W; Ferraz, AC

Abstract

We investigate the stability and electronic properties of defects formed by a substitutional nitrogen in GaAs (N-As) plus interstitial hydrogen atoms using first-principles total-energy calculations. We find the formation of strong N-As-H bond when a single H atom is incorporated in the lowest-energy bond centered (BC) position. This defect induces an electrically active level in the GaAs band gap. When two H atoms are incorporated, we find the stable N-As-H-2* complex as the lowest-energy configuration, with one H atom at the BC position and the second H atom at an antibonding position. The electronic structure of this complex shows the passivation of the gap level restoring the GaAs band gap. (C) 2002 American Institute of Physics.

Más información

Título según WOS: ID WOS:000179042200038 Not found in local WOS DB
Título de la Revista: APPLIED PHYSICS LETTERS
Volumen: 81
Número: 20
Editorial: AMER INST PHYSICS
Fecha de publicación: 2002
Página de inicio: 3816
Página final: 3818
DOI:

10.1063/1.1521571

Notas: ISI