Photothermally Activated Two-Photon Absorption in Ion-Implanted Silicon Quantum Dots in Silica Plates

Torres-Torres, C.; Bornacelli, J.; Rangel-Rojo, R.; Garcia-Merino, J. A.; Can-Uc, B.; Tamayo-Rivera, L.; Cheang-Wong, J. C.; Rodriguez-Fernandez, L.; Oliver, A.

Abstract

The third-order nonlinear infrared and ultraviolet properties exhibited by silicon quantum dots irradiated by ultrashort pulses were studied. The samples were prepared by 1.5MeV Si+2 ion implantation processes in high-purity silica substrates. Femtosecond z-scan measurements conducted at 830 nm wavelength revealed strong self-focusing effects together with two-photon absorption that can be switched to saturable absorption as a function of the input irradiance. Changes in the main physical mechanism responsible for the picosecond absorptive nonlinearity in the sample were also observed at 355 nm, made possible by the assistance of photothermal phenomena. Ultraviolet self-diffraction explorations allowed us to estimate the Kerr effect of the nanostructures. Potential applications for developing all-optical filtering functions performed by silicon-based nanosystems can be considered.

Más información

Título según WOS: ID WOS:000426756600001 Not found in local WOS DB
Título de la Revista: JOURNAL OF NANOMATERIALS
Editorial: HINDAWI LTD
Fecha de publicación: 2018
DOI:

10.1155/2018/3470167

Notas: ISI