Abstract

This work deals with the plasma polymerisation of two siloxane precursors, [hexamethyldisiloxane (HMDSO) and tetramethyldisiloxane (TMDSO)] with an atmospheric pressure pseudoglow dielectric barrier discharge operated in argon and an argon-air mixture. The influence of gas composition and precursor type on the physical and chemical properties of the deposited films is examined in detail using contact angle measurements, Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM). Results clearly show that precursor type as well as gas composition has an profound impact on film growth rate and chemical composition of the deposited films. Plasma polymerisation of both siloxane precursors in argon leads to the formation of hydrophobic polymers consisting of a Si-O-Si backbone, while for deposition in an argon-air mixture, hydrophilic inorganic silica-like coatings are obtained.