Kondo Effect and Magnetotransport Properties in Co-Cu Microwires

Ilyn, M.; Zhukova, V.; Garcia, C.; del Val, J. J.; Ipatov, M.; Granovsky, A.; Zhukov, A.

Abstract

We studied magnetic, transport and structural properties of granular Co-x - Cu100-x glass-coated microwires. Co-Cu microwires exhibited considerable magnetoresistance (MR) effect. For x = 5% we observed the resistivity minimum at 40 K associated with the Kondo effect. For x > 10partial evidences of granular structure have been observed. Temperature dependence of magnetization measured in microwires Co-x - Cu100-x with x >= 10 during a cooling regime without external magnetic field (ZFC) and in the presence of the field (FC) show considerable difference at low temperatures, attributed by us with the presence of small Co grains embedded in the Cu matrix. By X-ray diffraction we found, that the structure of the metallic nucleus is granular consisting of two phases: fcc Cu appearing in all the samples and fcc alpha-Co presented only in microwires with higher Co content. For low Co content (x = 10%) XRD magnetic and magneto-transport measurements indicate that Co atoms and small Co clusters are distributed within the Cu crystals.

Más información

Título según WOS: ID WOS:000310194400204 Not found in local WOS DB
Título de la Revista: IEEE TRANSACTIONS ON MAGNETICS
Volumen: 48
Número: 11
Editorial: IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Fecha de publicación: 2012
Página de inicio: 3532
Página final: 3535
DOI:

10.1109/TMAG.2012.2205907

Notas: ISI