Article ISI SCOPUS
JOURNAL OF CHEMICAL PHYSICS  (2005)

Atomic force microscopy measurements of topography and friction on dotriacontane films adsorbed on a SiO2 surface

Trogisch, S; Simpson, MJ; Taub H.; Volkmann, UG; Pino M.; Hansen, FY

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Título según WOS: Atomic force microscopy measurements of topography and friction on dotriacontane films adsorbed on a SiO2 surface
Título según SCOPUS: Atomic force microscopy measurements of topography and friction on dotriacontane films adsorbed on a SiO 2 surface
Título de la Revista: JOURNAL OF CHEMICAL PHYSICS
Volumen: 123
Número: 15
Editorial: AMER INST PHYSICS
Fecha de publicación: 2005
Idioma: English
URL: http://scitation.aip.org/content/aip/journal/jcp/123/15/10.1063/1.2060707
DOI:

10.1063/1.2060707
Notas: ISI, SCOPUS