The Dispersion Time of RandomWalks on Finite Graphs

Rivera, Nicolas; Sauerwald, Thomas; Stauffer, Alexandre; Sylvester, John; Assoc Comp Machinery

Abstract

We study two random processes on an n-vertex graph inspired by the internal diffusion limited aggregation (IDLA) model. These processes can also be regarded as protocols for allocating jobs in a distributed network of servers. In both processes n particles start from an arbitrary but fixed origin. Each particle performs a simple random walk until it first encounters an unoccupied vertex, at which point the vertex becomes occupied and the random walk terminates. In one of the processes, called Sequential-IDLA, a single particle moves until settling and only then does the next particle start whereas in the second process, called Parallel-IDLA, all unsettled particles move simultaneously. The second process is akin to running the first in parallel. Our main goal is to analyze the so-called dispersion time of these processes, which is the maximum number of steps performed by any of the n particles. In order to compare the two processes, we develop a coupling which shows the dispersion time of the Parallel-IDLA stochastically dominates that of the Sequential-IDLA; however, the total number of steps performed by all particles has the same distribution in both processes. This coupling also gives us that dispersion time of Parallel-IDLA is bounded in expectation by dispersion time of the Sequential-IDLA up to a multiplicative logn factor. Moreover, we derive asymptotic upper and lower bound on the dispersion time for several graph classes, such as cliques, cycles, binary trees, d-dimensional grids, hypercubes and expanders. Most of our bounds are tight up to a multiplicative constant.

Más información

Título según WOS: ID WOS:000507618500014 Not found in local WOS DB
Título de la Revista: SPAA'19: PROCEEDINGS OF THE 31ST ACM SYMPOSIUM ON PARALLELISM IN ALGORITHMS AND ARCHITECTURESS, 2019
Editorial: ASSOC COMPUTING MACHINERY
Fecha de publicación: 2019
Página de inicio: 103
Página final: 113
DOI:

10.1145/3323165.3323204

Notas: ISI