Influence of dry-etch patterning of top electrode and SrBi2Ta2O9 on the properties of ferroelectric capacitors
Abstract
In this article, we investigate the influence of the dry etch of SrBi2Ta2O9 (SBT) and Pt top electrode (TE) on the ferroelectric properties of Pt/SBT/Pt capacitors, and we discuss the effect of recovery anneals applied after TE deposition, TE etch, and SBT etch. We have determined that the TE etch step damages the capacitors through a charging effect, which is dependent on the perimeter-to-area ratio. Complete recovery of the electrical damage is provided by an anneal step after TE etch. We have also evidenced a lateral physical damaging of the SBT film after SBT dry etch, which is well correlated with the observed degradation of the remanent polarization P-r of the capacitors. A strong further degradation of P-r is found when the Pt bottom electrode is significantly etched during the SBT overetch.
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Título según WOS: | ID WOS:000233093000046 Not found in local WOS DB |
Título de la Revista: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volumen: | 152 |
Número: | 12 |
Editorial: | ELECTROCHEMICAL SOC INC |
Fecha de publicación: | 2005 |
Página de inicio: | C865 |
Página final: | C869 |
DOI: |
10.1149/1.2120407 |
Notas: | ISI |