MOCVD of Sr-containing oxides: Transport properties and deposition mechanisms of the Sr(tmhd)(2)center dot pmdeta precursor

Bedoya, C; Condorelli, GG; Motta, A; Di Mauro, A; Anastasi, G; Fragala, IL; Lisoni, JG; Wouters, D

Abstract

Metal-organic (MO)CVD processes adopting the Sr(tmhd)(2)(.)pmdeta precursor have been investigated. In-situ Fourier-transform infrared spectroscopy (FTIR) monitoring has shown that Sr(tmhd)2.pmdeta possesses a low stability which precludes efficient sublimation/evaporation processes, and requires reactors equipped with a direct liquid injector (DLI) for suitable MOCVD processes. The deposition process results in the formation of polycrystalline SrO and/or SrCO3 films. The kinetics and the mechanism of film growth have been investigated combining in-situ FTIR techniques and ex-situ techniques for chemical and structural analyses - energy dispersive X-ray (EDX) microanalysis, X-ray photoelectron spectroscopy (XPS), and X-ray diffraction (XRD). Precursor decomposition occurs above 300 degrees C, leading to the formation of ketones and SrO films. Temperatures above 400 degrees C and partial pressures above 9 mtorr favor a further oxidation/combustion of the ligand and its by-products, thus producing greater amounts of CO2, and hence of SrCO3.

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Título según WOS: ID WOS:000229767100007 Not found in local WOS DB
Título de la Revista: CHEMICAL VAPOR DEPOSITION
Volumen: 11
Número: 5
Editorial: WILEY-V C H VERLAG GMBH
Fecha de publicación: 2005
Página de inicio: 269
Página final: 275
DOI:

10.1002/cvde.200406356

Notas: ISI