Abstract

Nanostructured systems of SiO2 and TiO2 produced by magnetron sputtering technique have allowed the development of optical filters that maximize the conversion of light in different devices and applications [1?4]. The anti-reflective coatings (ARCs) of SiO2 / TiO2 systems allow obtaining a greater contrast and better image quality in applications such as TV screens, cell phones, projectors, among others. In addition, they improve the quantum efficiency in photovoltaic panels, increasing the power generation capacity [5]. In this research nanostructured films composed by multilayer stacking of SiO2 and TiO2 were studied, considering the working pressure and the partial pressure of O2 as variables for the modification of the microstructure of each monolayer and the influence on the anti-reflective response of the multilayer SiO2/TiO2 system. The nanostructured layers of TiO2 and SiO2 were synthesized by magnetron sputtering RF, using ceramic targets of TiO2 and SiO2. The modulation of the optical performance of the ARCs were measured using spectrophotometry and ellipsometry. On the other hand, the microstructure of the ARC?s was obtained using FE-SEM, AFM, XRD, and FTIR.