Abstract

In this paper we report the utilization of a series of alkyltropolonate Cu(II) complexes as precursors for the direct photodeposition of amorphous thin films of Cu(I) oxide. Linear and branched alkyl substituents in the tropolone ligands were used to diminish the intermolecular interactions and in this way improve the quality of the films. Spin-coating techniques were used for the deposition of precursor films which were evaluated by optical microscopy, prior to irradiation with 254 nm UV light. Characterization of the photodeposited films by XRD and Auger spectroscopy showed the formation of Cu2O. The photochemical deposition of patterns of copper oxide was shown to be compatible with standard lithographic techniques by the lithography of 2 x 100