Thickness dependence of infrared lattice absorption and excitonic absorption in ZnO layers on Si and SiO2 grown by atomic layer deposition

Samarasingha, Nuwanjula S.; Zollner, Stefan

Abstract

Using spectroscopic ellipsometry from the midinfrared (0.03eV) to the deep ultraviolet (6.5eV), the authors determined the thickness dependence of the dielectric function for ZnO thin layers (5-50nm) on Si and quartz in comparison to bulk ZnO. They observed a small blueshift of the band gap ( similar to 80meV) in thin ZnO layers due to quantum confinement, which is consistent with a simple effective mass theory in an infinite potential well. There is a drastic reduction in the excitonic effects near the bandgap, especially for thin ZnO on Si, which not only affects the excitonic absorption peak but also lowers the high-frequency dielectric constant by up to 40%. No significant change of the phonon parameters (except an increased broadening) in thin ZnO layers was found.

Más información

Título según WOS: ID WOS:000569109900017 Not found in local WOS DB
Título de la Revista: JOURNAL OF VACUUM SCIENCE TECHNOLOGY B
Volumen: 38
Número: 4
Editorial: A V S AMER INST PHYSICS
Fecha de publicación: 2020
DOI:

10.1116/6.0000184

Notas: ISI