INVESTIGATION AND OPTICAL EVALUATION OF PRECURSORS FOR THE PHOTODEPOSITION OF NANOSIZED ZnS AMORPHOUS THIN FILMS

Tejos M.; Rolon, BG; Del Rio R.; Cabello, G

Abstract

Thin amorphous nanostructured ZnS films have been photochemically obtained by means of direct UV radiation (X= 254 nm) of the complex Zn [ (CH3)2CHCH2OCS2 ]2 deposited on Si(100) and on ITO glass through the spin-coating technique. The UV photolysis of thin films of Zinc Xanthate complex results in the loss of all ligands from the coordination sphere. The binding energy values for as-deposited films in X-Ray Photoelectron Spectra were 1022.7 eV for Zn2p3 and 163-169 eV for S 2p. The as-deposited film showed a non-uniform rough surface with a root-mean-square (rms) roughness of 48.5 nm and a maximum height, Rmax, of 460.5 nm. The annealed ZnS films showed a uniform and a reasonably light but smooth surface with a rms roughness of 43.0 nm and Rmax of 274.2 nm. The optical band gap was determined and found to be 3.2

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Título según WOS: Investigation and optical evaluation of precursors for the photodeposition of nanosized ZnS amorphous thin films
Título según SCOPUS: Investigation and optical evaluation of precursors for the photodeposition of nanosized ZnS amorphous thin films
Título según SCIELO: INVESTIGATION AND OPTICAL EVALUATION OF PRECURSORS FOR THE PHOTODEPOSITION OF NANOSIZED ZnS AMORPHOUS THIN FILMS
Título de la Revista: JOURNAL OF THE CHILEAN CHEMICAL SOCIETY
Volumen: 52
Número: 3
Editorial: 2013
Fecha de publicación: 2007
Página de inicio: 1257
Página final: 1260
Idioma: English
DOI:

10.4067/S0717-97072007000300015

Notas: ISI, SCIELO, SCOPUS