Article
JOURNAL OF PHYSICAL CHEMISTRY C  (2022)

The relation between surface reactive sites and precursor choice for area-selective atomic layer deposition using small molecule inhibitors

2. Merkx M. J. M.; Angelidis A.; Li J.; Lemaire P.C.; Sharma K.; Hausmann D. M.; Kessels W. M. M.; Sandoval T. E.; Mackus A. J. M.