Microstructural characterization of dispersion-strengthened Cu-Ti-Al alloys obtained by reaction milling
Abstract
The microstructure, electrical conductivity and hot softening resistance of two alloys (G-10 and H-20), projected to attain Cu-2.5 vol.% TiC-2.5 vol.% Al2O3 nominal composition, and prepared by reaction milling and hot extrusion, were studied. The alloys were characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and several chemical analysis techniques. The first alloy, G-10, showed the formation of Al2O3 nanodispersoids and the presence of particles from non-reacted raw materials (graphite, Ti and Al). A second alloy, H-20, was prepared employing different fabrication conditions. This alloy exhibited a homogeneous distribution of Al2O3 and Ti-Al-Fe nanoparticles, with the microstructure being stable after annealing and hot compression tests. These nanoparticles acted as effective pinning sites for dislocation slip and grain growth. The room-temperature hardness of the H-20 consolidated material (330 HV) was approximately maintained after annealing for 1 h at 1173 K; the electrical conductivity was 60% IACS (International Annealing Copper Standard). © 2006 Elsevier B.V. All rights reserved.
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Título según WOS: | Microstructural characterization of dispersion-strengthened Cu-Ti-Al alloys obtained by reaction milling |
Título según SCOPUS: | Microstructural characterization of dispersion-strengthened Cu-Ti-Al alloys obtained by reaction milling |
Título de la Revista: | MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING |
Volumen: | 454 |
Editorial: | ELSEVIER SCIENCE SA |
Fecha de publicación: | 2007 |
Página de inicio: | 183 |
Página final: | 193 |
Idioma: | English |
URL: | http://linkinghub.elsevier.com/retrieve/pii/S0921509306024555 |
DOI: |
10.1016/j.msea.2006.11.042 |
Notas: | ISI, SCOPUS |