Use of a plasma focus device to study pulsed x-ray effects on peripheral blood lymphocytes: Analysis of chromosome aberrations

Verdejo, Valentina; Radl, Analia; Barquinero, Joan-Francesc; Jain, Jalaj; Davis, Sergio; PAVEZ-MORALES, CRISTIAN ARTURO; SOTO-NORAMBUENA, LEOPOLDO ALEJANDRO; MORENO-MARTINEZ, JOSE ALBERTO

Abstract

X-ray pulses (full width at half maximum similar to 90 ns, dose rate similar to 10(7) Gy s(-1)) were used to irradiate the monolayer of peripheral blood mono-nucleated cells using the PF-2kJ kilojoule plasma focus device. Four different exposure conditions were evaluated using 5, 10, 20, and 40 pulses, with the mean dose measured by TLD-100 being 0.12 +/- 0.02 mGy, 0.14 +/- 0.03 mGy, 0.22 +/- 0.06 mGy, and 0.47 +/- 0.09 mGy, respectively. Cytogenetic analysis showed an increase in all types of chromosomal aberrations following exposure to x-ray pulses. The distribution of dicentrics and centric rings was overdispersed after 5, 10, 20, and 40 pulses. Additionally, after 20 and 40 pulses, the presence of tricentric chromosomes is detected. Chromosome aberration frequencies found in this study were always higher than the estimated frequencies of chromosome aberrations using published dose-effect curves for conventional radiation sources. The overdispersion observed, the elevated maximum relative biological effectiveness (RBEM) and the presence of tricentric chromosomes at the relatively low doses of exposure (<0.5 Gy) seem to indicate that low doses of pulsed x-rays of low energy show similar biological effects as those observed for high-LET radiation. X-ray pulses emitted by PF-2kJ were found to be more efficient in inducing chromosome aberrations, even more than a particles.

Más información

Título según WOS: Use of a plasma focus device to study pulsed x-ray effects on peripheral blood lymphocytes: Analysis of chromosome aberrations
Título según SCOPUS: ID SCOPUS_ID:85158834258 Not found in local SCOPUS DB
Título de la Revista: JOURNAL OF APPLIED PHYSICS
Volumen: 133
Editorial: AMER INST PHYSICS
Fecha de publicación: 2023
DOI:

10.1063/5.0141529

Notas: ISI, SCOPUS