Reduction Mechanism of O-2 in DMSO and Metal Oxide Thin Film Formation: CdO Case Study

Henríquez R.; Grez, P; Muñoz E; Dalchiele, EA; Marotti, R; Gómez H.

Abstract

The electrochemical reduction of O2 in a dimethyl sulfoxide (DMSO) solution onto a glassy carbon substrate at 423 K has been studied. Electrochemical potentiodynamic studies show that the reduction process is controlled by O2 diffusion and reveal a two-step mechanism. The first one corresponds to an electrochemical step which gives the superoxide ion that, in a second chemical step, forms the peroxide ions through a disproportion reaction. The proposed mechanism can be used for the formation of semiconductor CdO thin films. Here, results for CdO film formation, obtained in a direct way without the presence of Cd (OH)2 mixtures, are presented. © 2009 The Electrochemical Society.

Más información

Título según WOS: Reduction Mechanism of O-2 in DMSO and Metal Oxide Thin Film Formation: CdO Case Study
Título según SCOPUS: Reduction mechanism of O2 in DMSO and metal oxide thin film formation: CdO case study
Título de la Revista: ELECTROCHEMICAL AND SOLID STATE LETTERS
Volumen: 12
Número: 8
Editorial: TAYLOR & FRANCIS LTD
Fecha de publicación: 2009
Página de inicio: H288
Página final: H291
Idioma: English
URL: http://esl.ecsdl.org/cgi/doi/10.1149/1.3133842
DOI:

10.1149/1.3133842

Notas: ISI, SCOPUS