Article ISI SCOPUS
Plasma Sources Science and Technology  (2010)

Studies on scalability and scaling laws for the plasma focus: similarities and differences in devices from 1 MJ to 0.1 J

Soto, L; Pavez, C; Tarifeño A.; Moreno, J; Veloso, F

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Título según WOS: Studies on scalability and scaling laws for the plasma focus: similarities and differences in devices from 1 MJ to 0.1 J
Título según SCOPUS: Studies on scalability and scaling laws for the plasma focus: Similarities and differences in devices from 1MJ to 0.1 J
Título de la Revista: Plasma Sources Science and Technology
Volumen: 19
Número: 5
Editorial: Institute of Physics Publishing
Fecha de publicación: 2010
Idioma: English
URL: http://stacks.iop.org/0963-0252/19/i=5/a=055017?key=crossref.65a3e6b0771efa8150f0b1d998eed3d0
DOI:

10.1088/0963-0252/19/5/055017
Notas: ISI, SCOPUS