The galaxy bias profile of cosmic voids
Keywords: large-scale structure of universe, methods: numerical, methods: statistical, galaxies: statistics, galaxies: formation
Abstract
Context. Cosmic voids are underdense regions within the large-scale structure of the Universe, spanning a wide range of physical scales from a few megaparsecs to the largest observable structures. Their distinctive properties make them valuable cosmological probes and unique laboratories for galaxy formation studies. A key aspect to investigate in this context is the galaxy bias, b, within voids that is, how galaxies in these underdense regions trace the underlying dark-matter density field. Aims. We aim to measure the dependence of the large-scale galaxy bias on the distance to the void center and to evaluate whether this bias profile varies with the void properties and identification procedure. Methods. We applied a void identification scheme based on spherical overdensities to galaxy data from the IllustrisTNG magnetohydrodynamical simulation. For the clustering measurement, we used an object-by-object estimate of large-scale galaxy bias, which offers significant advantages over the standard method based on ratios of correlation functions or power spectra. Results. We find that the average large-scale bias of galaxies inside voids tends to increase with void-centric distance when normalized by the void radius. For the entire galaxy population within voids, the average bias rises with the density of the surrounding environment and, consequently, decreases with increasing void size. Due to this environmental dependence, the average galaxy bias inside S-type voids embedded in large-scale overdense regions is significantly higher (?b?
Más información
| Título según WOS: | The galaxy bias profile of cosmic voids |
| Título según SCOPUS: | The galaxy bias profile of cosmic voids |
| Título de la Revista: | Astronomy and Astrophysics |
| Volumen: | 703 |
| Editorial: | EDP Sciences |
| Fecha de publicación: | 2025 |
| Idioma: | English |
| DOI: |
10.1051/0004-6361/202555221 |
| Notas: | ISI, SCOPUS |