Pulsed deposition: Model for the cluster size distribution after the first pulse

Fuenzalida, V.M.

Keywords: cluster, models, growth, diffusion, size, density, distribution, equation, deposition, nucleation, film, monomers, condensation, annealing, mathematical, pulsed, (specific, gravity), Smoluchovsky, Submonolayer


A model is presented for the evolution of the submonolayer cluster size distribution after the pulsed deposition of material onto a smooth surface at low temperature, which is annealed to promote diffusion and nucleation. The system is described by a set of Smoluchovsky equations and solved exactly for clusters of linear shape and numerically otherwise. The condensation exhibits a universal behavior, in which physical parameters such as diffusion coefficient and initial monomer density affect only the time scale of the process but not the final cluster size distribution. © 1998 Elsevier Science B.V. All rights reserved.

Más información

Título de la Revista: Journal of Crystal Growth
Volumen: 183
Número: 3
Fecha de publicación: 1998
Página de inicio: 497
Página final: 503
URL: http://www.scopus.com/inward/record.url?eid=2-s2.0-0032472142&partnerID=q2rCbXpz