Kinked Silicon Nanowires: Superstructures by Metal-Assisted Chemical Etching

Sandu, Georgiana; Osses, Jonathan Avila; Luciano, Marine; Caina, Darwin; Stopin, Antoine; Bonifazi, Davide; Gohy, Jean-Francois; Silhanek, Alejandro; Florea, Ileana; Bahri, Mounib; Ersen, Ovidiu; Leclere, Philippe; Gabriele, Sylvain; Vlad, Alexandru; Melinte, Sorin


We report on metal-assisted chemical etching of Si for the synthesis of mechanically stable, hybrid crystallographic orientation Si superstructures with high aspect ratio, above 200. This method sustains high etching rates and facilitates reproducible results. The protocol enables the control of the number, angle, and location of the kinks via successive etch-quench sequences. We analyzed relevant Au mask catalyst features to systematically assess their impact on a wide spectrum of etched morphologies that can be easily attained and customized by fine-tuning of the critical etching parameters. For instance, the designed kinked Si nanowires can be incorporated in biological cells without affecting their viability. An accessible numerical model is provided to explain the etch profiles and the physicochemical events at the Si/Au-electrolyte interface and offers guidelines for the development of finite-element modeling of metal-assisted Si chemical etching.

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Título según WOS: ID WOS:000497259300015 Not found in local WOS DB
Título de la Revista: NANO LETTERS
Volumen: 19
Número: 11
Fecha de publicación: 2019
Página de inicio: 7681
Página final: 7690


Notas: ISI