Thick tellurium electrodeposition on nickel-coated copper substrate for I-124 production

Sadeghi M.; Dastan, M; Ensaf, MR; Tehrani, AA; Tenreiro, C.; Avila M.

Abstract

Tellurium electrodeposition on a nickel-coated copper substrate was investigated for production of iodine-124. The electrodeposition experiments were carried out by the alkali plating baths. The optimum conditions of the electrodeposition of tellurium were as follows: 6 g l-1 tellurium, pH=10, DC current density of ca. 8.55 mA cm-2 and room temperature. © 2008 Elsevier Ltd. All rights reserved.

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Título según WOS: Thick tellurium electrodeposition on nickel-coated copper substrate for I-124 production
Título según SCOPUS: Thick tellurium electrodeposition on nickel-coated copper substrate for 124I production
Título de la Revista: APPLIED RADIATION AND ISOTOPES
Volumen: 66
Número: 10
Editorial: PERGAMON-ELSEVIER SCIENCE LTD
Fecha de publicación: 2008
Página de inicio: 1281
Página final: 1286
Idioma: English
URL: http://linkinghub.elsevier.com/retrieve/pii/S0969804308001358
DOI:

10.1016/j.apradiso.2008.02.082

Notas: ISI, SCOPUS