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Partha Saikia

Postdoctoral Researcher

Pontificia Universidad Católica de Chile

Santiago, Chile

Líneas de Investigación


1. Experimental plasma physics, mainly focused on industrial application of plasma, plasma-processed material characterization and plasma diagnostics. 2. Nano material science.

Educación

  •  Plasma Physics, GAUHATI UNIVERSITY. India, 2015
  •  Physics, Indian Institute of Technology Guwahati (IITG). India, 2007
  •  Physics, GAUHATI UNIVERSITY. India, 2005

Experiencia Académica

  •   Junior Research fellow Full Time

    CPP-IPR, Guwahati Assam

    Science

    Guwahati, India

    2009 - 2011

  •   Senior Research Fellow Full Time

    CPP-IPR, Guwahati, Assam

    Science

    Guwahati, India

    2012 - 2014

  •   Postdoctoral researcher Full Time

    Insititute for Plasma Research, Gandhinagar

    Gandhinagar, Gujarat, India

    2015 - 2015

  •   Postdoctoral researcher Full Time

    Pontificia Universidad Católica de Chile

    Santiago, Chile

    2015 - A la fecha

Premios y Distinciones

  •   Concurso Postdoctorado 2016 Fondecyt - Conicyt

    FONDECYT

    Chile, 2016

    3 Years post doctoral project titled: Application of radio frequency plasma and hybrid radio frequency-LASER plasma in material science.

  •   Institute Postdoc

    Institute for plasma reserach

    India, 2015

    Institute postdoc in SST tokamak for a period of one year.

  •   SLET

    Gauhati university

    India, 2014

    Rank 1 in the qualifying examination held for entire north eastern region of India.


 

Article (8)

An analytical model of multi-component radio frequency capacitively coupled plasma and experimental validation
Effect of hydrogen addition on the deposition of titanium nitride thin films in nitrogen added argon magnetron plasma
Study on the effect of hydrogen addition on the variation of plasma parameters of argon-oxygen magnetron glow discharge for synthesis of TiO2 films
Argon–oxygen dc magnetron discharge plasma probed with ion acoustic waves
Theoretical investigation of the effect of hydrogen addition on the formation and properties of soliton in direct current argon plasma
Effect of process parameters on properties of argon–nitrogen plasma for titanium nitride film deposition
Role of substrate and deposition conditions on the texture evolution of titanium nitride thin film on bare and plasma-nitrided high-speed steel
Study on the effect of target on plasma parameters of magnetron sputtering discharge plasma
8
Partha Saikia

Postdoctoral Researcher

Pontificia Universidad Católica de Chile

Santiago, Chile

3
heman bhuyan

Associate Professor

PONTIFICIA UNIVERSIDAD CATÓLICA DE CHILE (PUC)

santiago, Chile

1
Mario Favre

Profesor Titular

Instituto de Física, Pontificia Universidad Católica de Chile

Santiago, Chile

1
Jeronimo Maze

Associate Professor

Physics

FACULTAD DE FISICA, PONTIFICIA UNIVERSIDAD CATOLICA

Santiago, Chile

1
Fernando Guzmán

Profesor Asistente

Departamento de Física

Universidad Católica del Norte

Antofagasta, Chile

1
Felipe Veloso

Profesor Asociado

PONTIFICIA UNIVERSIDAD CATOLICA DE CHILE

Santiago, Chile

1
Donovan Diaz

Assistant Professor

PONTIFICIA UNIVERSIDAD CATÓLICA DE CHILE

Santiago, Chile